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TranslationMobile

刻蝕過(guò)程

"etching" in Chinese : n. 1.蝕刻法；蝕刻(銅)版畫(huà)；蝕鏤術(shù)。 2.蝕刻畫(huà)， ...
"process" in Chinese : vi. 〔口語(yǔ)〕排隊(duì)走，列隊(duì)行進(jìn) 〔procession ...
"etching process chemical" in Chinese : 蝕刻制程化學(xué)品
"gravure etching process" in Chinese : 凹版腐蝕法
"etching" in Chinese : n. 1.蝕刻法；蝕刻(銅)版畫(huà)；蝕鏤術(shù)。 2.蝕刻畫(huà)，蝕刻版，蝕刻版印刷品 ...
"acid etching" in Chinese : 酸蝕處理; 酸蝕刻; 酸性浸蝕
"after etching" in Chinese : 殘余腐蝕; 后腐蝕; 后侵蝕
"alkaline etching" in Chinese : 堿腐蝕法; 堿侵蝕
"anisotropic etching" in Chinese : 蛤異性腐蝕; 各向異性刻蝕; 各向異性蝕刻，非等向性蝕刻
"anode etching" in Chinese : 陽(yáng)極電解腐蝕
"anodic etching" in Chinese : 陽(yáng)極浸蝕法; 陽(yáng)極侵蝕
"arc etching" in Chinese : 電弧刻蝕
"batch etching" in Chinese : 成批腐蝕
"bright etching" in Chinese : 光亮酸蝕刻
"bring etching" in Chinese : 光亮蝕刻

Examples

The resolution of an etching process is a measure of the fidelity of pattern transfer .
刻蝕工藝的分辨率是圖形轉(zhuǎn)移保真度的量度。
Aluminium target with deep amplitude modulation fabricated by chemical wet etching process
調(diào)制靶的化學(xué)腐蝕制備工藝研究
Studies on subsurface damage detection and wet - etching process of k9 optics
9基片的亞表面損傷探測(cè)及化學(xué)腐蝕處理技術(shù)研究
Surface ramam spectrpscopy for in situ investigating silicon etching process
前驅(qū)體法制備氮氧化硅納米線(xiàn)及其光學(xué)性能研究
In addition , the effect of collisions and a low source power can slow down the etching process
碰撞效應(yīng)和低電源功率減緩刻蝕的進(jìn)程。
John has been trying to develop a new etching process for months and he ' s finally struck oil
約翰已花了幾個(gè)月的時(shí)間來(lái)創(chuàng)造一種新的蝕刻工序，他最終獲得了成功。
The lithographic and etching process for a membrane creates a mesh of metal wires with silicon dioxide filling the space between them
薄膜先以微影及蝕刻制程制作出金屬線(xiàn)路，線(xiàn)路之間則填入二氧化矽。
The most competitive technologies of transferring solid membrane mainly include bond and etch process and smart cut process
最具競(jìng)爭(zhēng)力的轉(zhuǎn)移固體薄膜技術(shù)主要有鍵合加選擇性腐蝕工藝和注氫智能剝離工藝。
To approach as a resist in dry etching processing , etching properties of the films in oxygen plasma have been investigated
為了探索該種薄膜在干刻蝕工藝過(guò)程中用作掩膜的可能性，還研究了它在氧離子體中的刻蝕性能。
Plasma etching has been widely used in the etching process of si devices . now the study is focused on the microfabrication of compound semiconductor
等離子體干法刻蝕在硅器件的微細(xì)加工中已經(jīng)得到廣泛應(yīng)用，目前研究的焦點(diǎn)集中在化合物半導(dǎo)體。