中英
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- The basics of lithography process , as well as the basic structure of lithographic system and the basic theory of partially coherent imaging are introduced in this paper . a bi - linear model of optical imaging is also presented . based on these theories , the simulation process of csplat is particularly analyzed , especially the computation of tccs ( transmission cross coefficient ) under different illuminations and the processing of primary lens aberrations inside tcc computation process
本文從光刻基本過程入手，介紹了光刻機(jī)光學(xué)系統(tǒng)的基本組成、部分相干光透射成像的基本原理，提出了光學(xué)系統(tǒng)的雙線性模型，并在此基礎(chǔ)上詳細(xì)分析了仿真軟件splat的仿真過程，其中著重分析了光學(xué)系統(tǒng)的傳輸交叉系數(shù)tcc的計(jì)算，包括不同照明系統(tǒng)下tcc的計(jì)算以及tcc計(jì)算中像差的處理。 - The exact expression is n = 4 " , in which n is the stage of koch curve . since we only consider one generator in computation process , so we simplify it as n = 4 ) . the critical point of this kind of koch curve is zero , also called zero temperature phase transition , and this is the character of all the limited branching systems
無分支科赫曲線是一種典型的分形，前人的研究都局限于n = 4 ( n是用線元，面元，或體元覆蓋分形系統(tǒng)所需要的覆蓋次數(shù)，確切的應(yīng)該寫成n = 4 ~ n ，其中n為科赫曲線的級(jí)，但我們?cè)谥卣河?jì)算時(shí)只考慮一個(gè)生成元，所以簡(jiǎn)化為n = 4 )情況，這種科赫曲線的相變點(diǎn)為零，是一種零溫相變，這也是有限分岔系統(tǒng)的相變特征。
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